只用于动物实验研究等 英国Ossila紫外线臭氧清洗机E511 进口紫外线臭氧清洗机UV Ozone Cleaner ApplicationsExamples of applications for UV Ozone cleaners: - Surface cleaning
- Preparation for thin film deposition
- UV curing
- Surface sterilization
- Cleaning of AFM/STM probes
- UV chemical reactions
- Cleaning of optical components
- Improving surface hydrophilicity
- Removal of surface monolayers
- Oxidation of surfaces
| Examples of materials that can be cleaned: - Quartz
- Silicon
- Silicon Oxide
- Silicon Nitride
- Gold
- Nickel
- Aluminium
- Gallium Arsenide
- Alumina
- Glass
- Stainless Steel
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英国Ossila紫外线臭氧清洗机E511 进口紫外线臭氧清洗机 The images below shows the impact of UV ozone treatment on a substrate to improve surface hydrophilicity.   Water drop on OTS-treated silicon substrate (300 nm SiO2 on surface) before UV ozone cleaning (left) and after 10 minutes UV ozone cleaning (right).
UV Ozone Cleaner FeaturesOssila's UV ozone cleaner has the following features: - Lowest-cost UV Ozone cleaner
- 120 mm x 120 mm sample stage
- Maximum sample height of 14 mm
- Simple loading-unloading using a drawer
- Safety interlock for sample drawer
- LCD display showing 'time passed' and 'time left'
- 60-minute timer
- High intensity UV light source
- High temperature thermal cutout
- Solvent-free cleaning of samples
- Provides ultra-clean surface
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UV Ozone Specifications| UV lamp type | Synthetic Quartz UV Grid Lamp | | UV lamp dominant wavelengths | 185 nm and 254 nm | | UV lamp dimensions | 100 mm x 100 mm | | UV lamp supply | 4000 V, 30 mA | | UV lamp lifetime | T80 (2000 hours); 8-10 years of standard daily use | | Power supply | 230 V, 0.6 A , 50 Hz // opt. ( 110 V, 1.2 A, 60 Hz ) | | Max run time | 59 minutes 59 seconds | | Safety features | Safety interlock, High temperature warning, thermal cutout | | Substrate tray size | 120 mm x 120 mm | | Maximum recommended substrate size | 100 mm x 100 mm | Overall Dimensions | Width 204 mm Height 227 mm Depth 300 mm |
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